The market for extreme ultraviolet lithography is projected to be worth US$ 1,560 million in 2022 and US$ 15,299 million by 2032, growing at a CAGR of 25.6% over that time. The rising use of smartphones around the world is one of the factors boosting the global market for extreme ultraviolet lithography. In the historical period from 2016 to 2021, the market for extreme ultraviolet lithography experienced a CAGR of 22.7%.
Implementation of lithography technology was highly witnessed in microprocessors, after its introduction. Continuous advancements and innovations in semiconductor industry has led to the introduction of Extreme Ultraviolet Lithography, an advanced lithography technique.
Extreme Ultraviolet Lithography technique is expected to replace currently adopted conventional optical lithography techniques for fabricating the microcircuits, which are widely installed in electronic devices, during the forecast period.
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Extreme Ultraviolet Lithography is a lithography technique which makes use of ultraviolet wavelengths, of the order of some nanometers, for generating a better resolved output. Extreme Ultraviolet Lithography use mirrors for reflection in replacement of refraction by lenses, as adopted in conventional lithography techniques. Primary application of an Extreme Ultraviolet Lithography is to print complex patterns that define integrated circuits onto semiconductor wafers.
Extreme Ultraviolet Lithography Market: Drivers and Challenges
Implementation of Extreme Ultraviolet Lithography enables an enhanced output when compared with conventional lithography techniques. In addition to this, features such as smaller size, cost effectiveness, less power consumption and larger storage capacity in comparison to other lithography techniques are expected to be the driving factors for the growth of Extreme Ultraviolet Lithography market.
Lack of awareness amongst users, risk of unknown technical flaws and incomplete knowledge of the technology, as Extreme Ultraviolet Lithography is still in its nascent & development stage, are the major challenges against growth in the Extreme Ultraviolet Lithography’s market.
In addition to this, high cost associated with Extreme Ultraviolet Lithography and the preciseness required in the manufacturing of the complex designed mirror, a component of Extreme Ultraviolet Lithography, also acts as restraining factors for the overall Extreme Ultraviolet Lithography market.
Market Competition
Intel Corporation, Nikon Corporation, Canon Inc., IBM Corporation, ASML, and Samsung Corporation are some of the main participants in the Extreme Ultraviolet Lithography industry.
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Recent Market Developments in the Extreme Ultraviolet Lithography Market:
- In July 2022, Nikon announced collaboration with the environmental and water management organisation CIWEM and the free streaming platform WaterBear committed to the future of the world to identify the 2022 Environmental Photographer of the Year. The yearly competition, now in its 15th year, strives to highlight the most inspirational environmental photography from across the world and give an international platform to raise awareness of environmental concerns that threaten the planet.
Key Segments Profiled in the Extreme Ultraviolet Lithography Industry Survey
Extreme Ultraviolet Lithography Market by Light Source Type:
- Laser Produced Plasmas
- Vacuum Sparks
- Gas Discharges
Extreme Ultraviolet Lithography Market by Application:
- Light Emitting Diodes (LEDs)
- Micro-Fluidics
- Micro-Needles
- Biotechnology
Extreme Ultraviolet Lithography Market by Region:
- North America
- Latin America
- Europe
- Asia Pacific
- Middle East & Africa
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